Re: [rddp] RDDP Draft Status

["Talpey, Thomas" <[e-mail]>]

If folks haven't seen them, the new IETF "Tools" pages are
really spectacular and provide very easy access to these
statuses. Here's the URL for the RDDP WG:

	http://tools.ietf.org/wg/rddp/

Something I like very much as an author, is the ability
to view all versions of any active draft, and be able to
diff them against one another and check for ID-nits, etc.
You can get a taste of what the tools can do with the
links below. Highly recommended!

	<http://tools.ietf.org/wg/rddp/draft-ietf-rddp-arch/>
	<http://tools.ietf.org/wg/rddp/draft-ietf-rddp-problem-statement/>

I spoke with the RFC Editors just now here in Vancouver
on the Problem Statement and Architecture documents,
which they requested some clarifications on, and we
provided of course. (These were mostly references and
a dead URL or two.) The editors report that all issues are
now resolved, and the documents should move forward
to "AUTH48" (authors' 48-hour) status shortly. I'm pretty
sure my coauthors and I will approve that! :-)

Tom.

At 03:42 PM 11/8/2005, [e-mail] wrote:
>Since it's IETF week, and the RDDP WG is not meeting,
>I thought I'd report on the status of the WG's drafts.
>This is what I (as your WG chair) believe the status
>to be - please send me any corrections.
>
>Problem Statement and Architecture Drafts - Both are in
>	the RFC Editor Queue.  The RFC Editor has been actively
>	editing them, as queries on editing issues have been
>	seen recently, so RFC publication should happen
>	soon (for some value of "soon" ;-) ).
>
>All 6 remaining drafts (Applicability, Security, RDMAP,
>	DDP, MPA, and SCTP) are in Expert Review by our
>	Area Director (Jon Peterson).  In discussion with
>	Jon, we (Jon and yours truly) have decided to take
>	the 	Applicability and Security drafts forward to
>	IETF Last Call and the IESG first, and then follow
>	up with the other 4 drafts.  A new version of the
>	Applicability draft will be needed before IETF Last
>	Call, and a new version of the security draft will
>	probably be needed.  I hope to get a complete set
>	of comments and instructions to the authors of
>	these two drafts this week or early next week.
>
>Thanks,
>--David
>----------------------------------------------------
>David L. Black, Senior Technologist
>EMC Corporation, 176 South St., Hopkinton, MA  01748
>[phone]             FAX: [phone]
>[e-mail]        Mobile: [phone]
>----------------------------------------------------
>
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