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Re: [lamps] New Version Notification for draft-brockhaus-lamps-industrial-cmp-profile-00.txt

Sean Turner <sean@sn3rd.com> Thu, 14 March 2019 01:05 UTC

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From: Sean Turner <sean@sn3rd.com>
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Date: Wed, 13 Mar 2019 21:05:24 -0400
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To: hendrik.brockhaus@siemens.com
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Subject: Re: [lamps] New Version Notification for draft-brockhaus-lamps-industrial-cmp-profile-00.txt
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Hendrik,

Because this is aimed at "IoT scenarios” I guess I am confused as to how this relates to https://datatracker.ietf.org/doc/draft-ietf-ace-coap-est/, which is also aimed at constrained environments and completed WGLC in the ACE WG in January.

How does this draft update RFC4210?

spt

> On Mar 12, 2019, at 07:31, hendrik.brockhaus@siemens.com wrote:
> 
> Hallo 
> 
> Yesterday I submitted the initial draft on the lightweight industrial CMP profile I announced some weeks ago. At IETF 104 we want to introduce the draft during the LAMPS WG meeting.
> 
> The main purpose of this draft is to ease the use of CMP in industrial and IoT use cases. Due to the complexity of RFC4210 and RFC4211 the draft specifies a concrete and more lightweight profile of CMP. Following standardization of industrial CMP profiles by 3GPP and UNISIG that already exist, the draft strives for standardization of a more general purpose industrial CMP profile focussing on automating certificate management in m2m and IoT environments. 
> 
> If there are any feedback or comments to the draft in advance to the meeting, feel free to contact me.
> 
> - Hendrik
> 
> -----Ursprüngliche Nachricht-----
> Von: internet-drafts@ietf.org <internet-drafts@ietf.org> 
> Gesendet: Montag, 11. März 2019 12:27
> An: Fries, Steffen (CT RDA ITS) <steffen.fries@siemens.com>; Brockhaus, Hendrik (CT RDA ITS SEA-DE) <hendrik.brockhaus@siemens.com>; von Oheimb, David (CT RDA ITS SEA-DE) <david.von.oheimb@siemens.com>
> Betreff: New Version Notification for draft-brockhaus-lamps-industrial-cmp-profile-00.txt
> 
> 
> A new version of I-D, draft-brockhaus-lamps-industrial-cmp-profile-00.txt
> has been successfully submitted by Hendrik Brockhaus and posted to the IETF repository.
> 
> Name:		draft-brockhaus-lamps-industrial-cmp-profile
> Revision:	00
> Title:		Lightweight Industrial CMP Profile
> Document date:	2019-03-11
> Group:		Individual Submission
> Pages:		41
> URL:            https://www.ietf.org/internet-drafts/draft-brockhaus-lamps-industrial-cmp-profile-00.txt
> Status:         https://datatracker.ietf.org/doc/draft-brockhaus-lamps-industrial-cmp-profile/
> Htmlized:       https://tools.ietf.org/html/draft-brockhaus-lamps-industrial-cmp-profile-00
> Htmlized:       https://datatracker.ietf.org/doc/html/draft-brockhaus-lamps-industrial-cmp-profile
> 
> 
> Abstract:
>   The goal of this document is to facilitate interoperability and
>   automation by profiling the Certificate Management Protocol (CMP)
>   [RFC4210] and the related Certificate Request Message Format (CRMF)
>   [RFC4211].  It specifies a subset of CMP and CRMF focusing on typical
>   uses cases relevant for managing certificates of devices in
>   industrial and IoT scenarios.  To limit the overhead of certificate
>   management for constrained devices only the most crucial types of
>   transactions are specified as mandatory.  To foster interoperability
>   also in more complex scenarios, other types of transactions are
>   specified as recommended or optional.
> 
> 
> 
> 
> Please note that it may take a couple of minutes from the time of submission until the htmlized version and diff are available at tools.ietf.org.
> 
> The IETF Secretariat
> 
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